IKS PVD Technology (Shenyang) Co.,Ltd
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  • Worldwide Sales Representative
  • KING TECH CORPORATION
  • Tel:+886-6-2137155
  • Fax:886-6-2137667
  • Email:info@kingtechcorp.com
  • ADD:Rm. B2, 10F., No.189, Sec. 1, Yongfu Rd., West Central Dist., Tainan City 70051, Taiwan.
  • High Purity Rotatable Sputtering Target

    High Purity Rotatable Sputtering Target
    Introduction IKS specializes in producing high purity rotatable sputtering targets with the optimal process stability and performance for application in semiconductor, physical vapor deposition (PVD) display and optical industry. Our targets are offered in your specific requirements with the...
    Product Details:


    Introduction


    IKS specializes in producing high purity rotatable sputtering targets with the optimal process stability and performance for application in semiconductor, physical vapor deposition (PVD) display and optical industry. Our targets are offered in your specific requirements with the minimum purity of 99.5% up to 99.99% for pure elements and alloys.


    Adopting advanced Hot Isostatic Pressing (HIP) and Vacuum Melting technology, the rotatable sputtering targets from IKS are characterized by high purity, high density, homogenous composition, fine grain size and long service life. We monitor every step (from the raw materials to the finished products) to make sure that only high-quality targets can be shipped from our factories.


    IKS manufactures all sizes of high quality rotatable targets. Let us know the material and dimensions you need and we will meet your special requirement.



    Main Products:


    Material

    Symbol

    Atomic Ratio

    Purity

    Relative Density

    Technology

    Advantage

    Chromium

    Cr

    _____

    99.5%~99.95%

    >99%

    Hot    Isostatic Pressing (HIP)

    Good Oxidation Resistance

    Tungsten

    W

    _____

    99.5%~99.95%

    >99%

    Hot    Isostatic Pressing (HIP)

    High Hardness

    Titanium

    Ti

    _____

    99.9%~99.99%

    >99%

    Vacuum Melting

    Good Wear Resistance

    Nickel

    Ni

    _____

    99.9%~99.99%

    >99%

    Vacuum Melting

    Great Corrosion Resistance

    Molybdenum

    Mo

    _____

    99.9%~99.99%

    >99%

    Vacuum Melting

    Great Corrosion Resistance

    Silicon

    Si

    _____

    99.99%

    >99%

    Vacuum Melting

    High Hardness

    Silver

    Ag

    _____

    99.9%~99.99%

    >99%

    Vacuum Melting

    Good Electrical and Thermal Conductivity

    Tantalum

    Ta

    _____

    99.9%~99.99%

    >99%

    Vacuum Melting

    High Ductility

    Copper

    Cu

    _____

    99.9%~99.99%

    >99%

    Vacuum Melting

    High Ductility, Good Thermal Conductivity and Corrosion Resistance

    Graphite


    _____

    99.9%~99.99%

    >99%

    Vacuum Melting

    High Hardness

    Aluminum

    Al

    _____

    99.9%~99.99%

    >99%

    Vacuum Melting

    Good Ductility, Thermal Conductivity and Corrosion Resistance

    Silicon-Aluminum

    SiAl

    25/75

    30/70

    40/60

    50/50

    99.9%~99.99%

    >99%

    Hot Isostatic Pressing (HIP)

    High Ductility and Good Wear Resistance

    Titanium-Aluminum

    TiAl

    30/70

    33/67

    40/60

    45/55

    50/50

    60/40

    70/30

    75/25     80/20

    >99.7%    (2N7)

    >99%

    Hot Isostatic Pressing (HIP)

    High Mechanical Strength and Good Corrosion Resistance

    Chromium-Aluminum

    CrAl

    25/75

    30/70

    40/60

    50/50

    >99.7%    (2N7)

    >99%

    Hot Isostatic Pressing (HIP)

    Good Oxidation Resistance and Corrosion Resistance

    Titanium-Aluminum-Silicon

    TiAlSi

    30/60/10   40/50/10

    >99.7%    (2N7)

    >99%

    Hot Isostatic Pressing (HIP)

    High Hardness and Ductility

    Chromium-Aluminum-Silicon

    CrAlSi

    30/60/10   40/50/10

    >99.7%    (2N7)

    >99%

    Hot Isostatic Pressing (HIP)

    Good Oxidation Resistance and Corrosion Resistance




    More information:


    Certification: ISO9001

    Average Grain Size: 30-40μm (national standard is 100μm)

    Stock Dimensions: OD70xID56xL/ OD100xID80xL (unlimited length)

    Other special specifications are available on customer's request.




    Quality Analysis of TiAlSi Sputtering Target

    (Take TiAlSi 30/60/10 at% as a sample)


    Main component (wt%)

    Impurity content (%)

    TiAlSi

    C

    N

    O

    H

    Fe

    Ca

    >99.7

    0.0120

    0.0007

    0.1995

    0.0110

    0.0620

    0.0048

    Ti

    Al

    Si




    7.9%

    48.86%

    43.24%





    True density: 3.42(g/cm3)

    Theoretical density: >99%


    The average grain size of our rotatable target is 30-40μm which is far below the national standard (100μm).




    Compared to Planar Targets, Our Rotatable Sputtering Targets Can:


    ● Reduce the cost of ownership for large area coating operations.

    ● Provide larger erosion zones that provide 2 to 2.5 times the material utilization.

    ● Have longer service life that in turn results in much longer production runs and reduced downtime of the system.

    ● Increase the throughput of the coating equipment.

    ● Allow the use of higher power densities, and as a consequence, an increased deposition speed can be seen along with an improved performance during reactive sputtering.




    Application:


    Nowadays, rotatable target technology has been widely used in large area coating manufacturing of architectural glass, flat panel displays, solar photovoltaic and decorative coating. Our rotatable targets are very friendly to decorative film which ensures scratch resistance and decorative colorful finishes of hard coating on mobile phones, jewelry, watches, eyewear, automotive decoration, domestic appliances,  sanitary wares, hardware, etc.



    Packing: 1. Wooden box

                      2. Carton

                      3. As your request


    Payment: T/T, L/C, etc.


    Delivery time: Normally 20~30 days after payment


    Shipping: By air or by sea



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