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  • Effect Of Pulse Bias On Composition And Structure Of Multi-Arc Ion Plating Tialn Films
    Jul 13, 2018


    1. With the increase of pulse bias and duty cycle, the large particles on the surface are significantly reduced, and the surface topography effect is better.

     

    2. When the peak value of the bias voltage increases, the deposition rate becomes smaller; when the duty ratio is increased, the deposition rate first increases and then decreases, and when the duty ratio is 40%, the deposition rate is the largest.

     

    3. The atomic percentage of Al is mainly affected by the peak value of the pulse bias and decreases with the increase of the bias voltage. The percentage of Ti atom is mainly affected by the duty cycle and decreases with the increase of the duty cycle.

     

    4. With the increase of pulse bias, the hardness of the film increases first and then decreases. With the increase of the duty cycle, the hardness of the film increases first and then decreases, and there are obvious changes.