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  • PVD Materials
    Dec 28, 2017

    PVD or Physical Vapor Deposition Materials comprise a range of metals that can be used in sputtering magnetrons to create thin films and coatings. Angstrom Sciences also offers a comprehensive selection of high-purity vacuum deposition materials including:


    Aluminum

    Aluminum Copper

    Aluminum Copper          

    Tungsten

    Aluminum Nitride

    Aluminum Oxide

    Aluminum Silicon

    Antimony

    Barium

    Barium Ferrite

    Barium Fluoride

    Barium Strontium 

    Titanate

    Barium Titanate

    Barium Oxide

    Beryllium

    Bismuth

    Bismuth Lanthanum 

    Titanium

    Bismuth Strontium Calcium

    Bismuth Strontium Titanate

    Bismuth Titanium Oxide

    Bismuth Trioxide

    Boron

    Boron Carbide

    Boron Nitride

    Cadmium Fluoride

    Cadmium Oxide

    Cadmium Selenide

    Cadmium Sulfide

    Cadmium Telluride

    Calcium Fluoride

    Calcium Oxide

    Calcium Silicate

    Calcium Titanate

    Carbon (Graphite)

    Carbon Steel

    Cerium

    Cerium Oxide

    Chromium

    Chromium Boride

    Chromium Oxide

    Chromium Silicide

    Cobalt

    Cobalt Chromium

    Cobalt Oxide

    Cobalt Silicide

    Cobalt Zirconium

    Copper

    Copper Sulfide

    Copper Oxide

    Dysprosium

    Erbium

    Europium

    Gallium

    Gallium Arsenide

    Gallium Oxide

    Gadolinium

    Germanium

    Germanium Nitride

    Germanium Oxide

    Gold

    Gold Germanium

    Gold Palladium

    Gold Tin

    Gold Zinc

    Hafnium

    Hafnium Carbide

    Hafnium Nitride

    Hafnium Oxide

    Holmium

    Inconel

    Indium

    Indium Oxide

    Indium Tin Oxide

    Iridium

    Iron

    Iron Oxide

    Lead

    Lanthanum

    Lanthanum Aluminate

    Lanthanum Boride

    Lanthanum Oxide

    Lanthanum Strontium 

    Cobalt Oxide

    Lanthanum Manganese 

    Oxide

    Lead Oxide

    Lead Titanate

    Lead Zirconium Titanate 

    Oxide

    Lithium

    Lithium Carbonate

    Lithium Cobalt Oxide

    Lithium Niobate

    Lithium Phosphate

    Lithium Tantalate

    Magnesium

    Magnesium Fluoride

    Magnesium Monoxide

    Magnesium Oxide

    Manganese

    Molybdenum                    

    Molybdenum 

    Disulfide            

    Molybdenum Oxide

    Molybdenum Selenide

    Molybdenum Silicide

    Molybdenum Sulfide

    Neodymium                       

    Neodymium Gallium Oxide

    Neodymium Iron Boride

    Nickel

    Nickel Chromium

    Nickel Cobalt

    Nickel Oxide

    Nickel Silicide

    Nickel Vanadium

    Niobium

    Niobium Oxide

    Palladium

    Platinum

    Praseodymium

    Pryolytic Boron Nitride

    Rhenium

    Rhodium

    Ruthenium

    Samarium

    Samarium Cobalt

    Scandium

    Scandium Oxide

    Selenium

    Silicon

    Silicon Carbide

    Silicon Dioxide

    Silicon Monoxide

    Silicon Nitride

    Silver

    Silver Oxide

    Strontium Bismuth Niobium

    Oxide

    Strontium Bismuth Tantalum

    Niobium

    Strontium-doped Lanthanum

    Strontium Oxide

    Strontium Titanate

    Tantalum

    Tantalum Carbide

    Tantalum Nitride

    Tantalum Oxide

    Tantalum Silicide

    Tantalum Sulfide

    Tellurium

    Terbium

    Terbium Iron

    Thallium

    Thallium Oxide

    Thorium Fluoride

    Thorium Oxide

    Tin

    Tin Oxide

    Titanium

    Titanium Boride

    Titanium Carbide

    Titanium Nitride

    Titanium Oxide

    Titanium Silicide

    Titanium Sulfide

    Tungsten

    Tungsten Silicide

    Tungsten Sulfide

    Tungsten Titanium

    Vanadium

    Vanadium Pent Oxide

    Yttrium

    Yttrium Barium Copper Oxide

    Yttrium Oxide

    Zinc

    Zinc Oxide                             

    Zinc Selenide

    Zinc Sulfide

    Zirconium                              

    Zirconium Nitride                    

    Zirconium Oxide

    Zirconium Silicate

    Zirconium Oxide Yttrium Oxide


    There are three factors that influence the quality and functionality of a film deposited by Physical Vapor Deposition (PVD): the quality and performance of the deposition source, the properties and structure of the deposition materials, and the intrinsic performance and layout of the deposition system and its’ associated peripherals.  

    Not all materials are equivalent in these processes as the chemical composition of the source material is only the starting point of a robust, application-specific process.  Impurity levels, grain size, crystallographic structure/texture are but a few of the considerations that go into uniquely tailoring the structure of a suitable deposition structure.