IKS PVD Technology (Shenyang) Co.,Ltd
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  • IKS PVD Technology (Shenyang) Co.,Ltd
  • Tel:+86-24-89635131
  • Fax:+86-24-89335192
  • Email:IKS.PVD@foxmail.com
  • ADD:No.83-42 Puhe Road, Shenbei New District, Shenyang City, Liaoning Province, China
  • High Purity Planar Sputtering Target

    High Purity Planar Sputtering Target
    High Quality Planar Sputtering Target IKS provides high-quality planar sputtering targets for a wide range of applications for ferromagnetic, complex oxides, and semiconducting films. Our targets are offered in various purity levels to suit your specific requirements with the minimum purity of...
    Product Details:

    High Quality Planar Sputtering Target

     

    IKS provides high-quality planar sputtering targets for a wide range of applications for ferromagnetic, complex oxides, and semiconducting films. Our targets are offered in various purity levels to suit your specific requirements with the minimum purity of 99.5% up to 99.99% for pure elements and alloys.

     

    Adopting advanced hot isostatic pressing (HIP), vacuum sintering and vacuum melting technologies, the planar sputtering targets from IKS are characterized by high purity, high density, homogenous composition, fine grain size and long service life. We monitor every step (from the raw materials to the finished products) to make sure that only high-quality targets can be shipped from our factories.

     

    IKS manufactures all shapes and sizes of high quality planar targets. Let us know the material and dimensions you need and we will meet your special requirement.

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    Main Products:

    Material

    Symbol

    Atomic Ratio

    Purity

    Relative Density

    Stock Dimensions

    Technology

    Features

    Chromium

    Cr

    _____

    99.5%~99.95%

    >99%

    750x125x10mm
    170x75x12mm

    Hot Isostatic    Pressing (HIP)

    Good Oxidation Resistance

    Tungsten

    W

    _____

    99.9%~99.95%

    >99%

    750x125x10mm
         170x75x12mm

    Hot Isostatic    Pressing (HIP)

    High Hardness

    Titanium

    Ti

    _____

    99.9%~99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Vacuum Melting

    Good Wear  Resistance

    Nickel

    Ni

    _____

    99.9%~99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Vacuum Melting

    Great Corrosion Resistance

    Molybdenum

    Mo

    _____

    99.9%~99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Vacuum Melting

    Great Corrosion Resistance

    Silicon

    Si

    _____

    99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Vacuum Sintering

    High Hardness

    Silver

    Ag

    _____

    99.9%~99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Vacuum Melting

    Good Electrical and Thermal Conductivity

    Tantalum

    Ta

    _____

    99.9%~99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Vacuum Melting

    High Ductility

    Copper

    Cu

    _____

    99.9%~99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Vacuum Melting

    High Ductility, Good Thermal Conductivity and Corrosion Resistance

    Graphite


    _____

    99.9%~99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Vacuum Sintering

    High Hardness

    Aluminum

    Al

    _____

    99.9%~99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Vacuum Melting

    Good Ductility,Thermal Conductivity and Corrosion Resistance

    Silicon-Aluminum

    SiAl

    25/75   30/70   40/60      50/50

    99.9%~99.99%

    >99%

    750x125x10mm
         170x75x12mm

    Hot Isostatic   Pressing (HIP)

    High Ductility and Good Wear Resistance

    Titanium-Aluminum

    TiAl

    30/70  33/67   40/60      45/55   50/50   60/40      70/30   75/25   80/20

    >99.7% (2N7)

    >99%

    754x154x18mm
         331x174x22mm

    Hot Isostatic   Pressing (HIP)

    High Mechanical Strength and Good Corrosion Resistance

    Chromium-Aluminum

    CrAl

    25/75   30/70   40/60      50/50

    >99.7% (2N7)

    >99%

    754x154x18mm
         490x96x8mm

    Hot Isostatic    Pressing (HIP)

    Good Oxidation Resistance and Corrosion Resistance

    Titanium-Aluminum-Silicon

    TiAlSi

    30/60/10   40/50/10

    >99.7% (2N7)

    >99%

    754x154x18mm
         331x174x22mm

    Hot Isostatic    Pressing (HIP)

    High Hardness    and Ductility

    Chromium-Aluminum-Silicon

    CrAlSi

    30/60/10   40/50/10

    >99.7% (2N7)

    >99%

    754x154x18mm
         331x174x22mm

    Hot Isostatic    Pressing (HIP)

    Good Oxidation    Resistance and Corrosion Resistance

     

    More information:

    Certification: ISO9001

    Average Grain Size: 30-40μm (national standard is 100μm)

    Shape: Rectangular targets, Round target

    Other special specifications are available on customer’s request.

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    Quality Analysis of TiAl Sputtering Target

    (Take TiAl 30/70 at% as a sample)

    Main component (wt%)

    Impurity content (%)

    TiAl

    C

    N

    O

    Fe

    Si

    S

    >99.7

    0.01

    0.006

    0.2

    0.06

    0.02

    0.002

    Ti

    Al





    46.87%

    balance





    Dimension: 754x154x18mm

    True density: 3.31(g/cm3)

    Theoretical density: >99%


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    The average grain size of our planar target is 30-40μm which is far below the national standard (100μm).

     

    The IKS Advantages:

    ● Variety of materials including: Silver, Titanium, Aluminum, Silicon, Silicon-Aluminum Titanium-Aluminum-Silicon, Graphite and so on to suit your requirements.

    ● Incredibly tiny grain size and uniform microstructure assure consistent process performance through full end of life.

    ● Complete homogeneity and high purity levels of targets ensure the coating process is more stable and the deposited layers are of higher quality.

    ● Excellent density ensure the coating process can benefit from a particularly high level of conductivity

    ● The wonderful sputtering speeds due to the high density can help you save more time.

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    Application:

    In recent years, sputtering has been widely applied in semiconductor industry for Thin Film deposition of various materials in integrated circuit processing, architectural and automotive glass for energy conservation, colorful decorative coatings for hardware, hard wearing coatings for tools and consumer goods, and deposition of metals during fabrication of CDs, etc.

     

    Function of Hard Wearing Coatings:

    Provide hard surfaces with excellent corrosion resistance and wear resistance for cutting tools, punching and forming moulds to increase their service time, at the same time, the higher feed speeds, good cutting performance and excellent metal removal rates can be achieved easily.

    Also, when used in automotive engines, it can effectively reduce friction coefficient of surface on precision components.

     

    Function of Decorative Coatings:

    Ensure good scratch resistance and decorative colorful finishes for hard coating on mobile phones, jewelry, watches, eyewear, automotive decoration, domestic appliances, bathroom and kitchen hardware, etc.

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