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  • IBAD IBED IAD Ion Beam Assisted Deposition

    IBAD IBED IAD Ion Beam Assisted Deposition
    (lon Beam Assisted Depositon or Ion Beam Enhanced Deposition (IBAD or IBED) is a composite surface Ion processing technology that combines Ion Beam implantation with gas Deposition Deposition technology, and also a new technology for surface treatment optimization of Ion Beam. In the process of surface modification of ion-implantation material, this composite deposition technology makes the film and matrix mix at the interface caused by cascade collision caused by ion-implantation, and generates transition layer and firmly combines. Therefore, ion beam bombardment occurs at the same time as film deposition. Therefore, it is an important development of ion beam modification technology and a new surface composite ion treatment technology combining ion injection and coating technology.
    Product Details:

    (lon Beam Assisted Depositon or Ion Beam Enhanced Deposition (IBAD or IBED) is a composite surface Ion processing technology that combines Ion Beam implantation with gas Deposition Deposition technology, and also a new technology for surface treatment optimization of Ion Beam. In the process of surface modification of ion-implantation material, this composite deposition technology makes the film and matrix mix at the interface caused by cascade collision caused by ion-implantation, and generates transition layer and firmly combines. Therefore, ion beam bombardment occurs at the same time as film deposition. Therefore, it is an important development of ion beam modification technology and a new surface composite ion treatment technology combining ion injection and coating technology.

    ZY10121

    Advantages:


    1. Ion-beam assisted deposition does not require gas discharge in a vacuum chamber to generate plasma, which can be < 10-2pa


    Medium coating reduces gas pollution.


    2. The basic process parameters (ion beam energy, ion beam density) are parameters, and some non-electrical parameters such as gas flow control are generally not needed, which can easily control the growth of the film layer, adjust the composition, structure and process repeatability of the film.


    3. The workpiece surface can be coated with a film completely different from the substrate and with a thickness not limited by the energy of bombardment ions at low temperature (<200 ℃).It is suitable for the surface treatment of electronic functional film, cold machining precision die and low temperature tempering structural steel.


    4. Ion beam assisted deposition is a nonequilibrium process controlled at room temperature.New functional films such as high temperature phase, metastable phase and amorphous alloy can be obtained at room temperature.



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