Application prospect of high ionization rate pulse sputtering technology（HiPIMS）

Application prospect of high ionization rate pulse sputtering technology(HiPIMS)

To deposit more dense and high-performance decorative films, it is necessary to seek more efficient plasma discharge methods. The high ionization rate pulse sputtering technology (HiPIMS) developed in recent years has the characteristics of high plasma density, high ionization rate of the sputtered material, high average ion charge number, high ion energy, and a large proportion of film-forming ions. The film prepared by HiPIMS technology has fewer defects, a smoother surface, and a denser surface, and has higher hardness, binding force, wear resistance, and corrosion resistance. With the continuous improvement of this technology, it is expected to bring a new leap forward for sputtering coating. Above all, PVD decorative coating technology in the process of our development is facing many challenges, but through continuous exploration and innovation, also provides opportunities for technology to further improve. In the future, with the in-depth study and solution of these problems, PVD decorative coating technology will play a greater role in more fields.

IKS PVD company, decorative coating machine, tools coating machine, DLC coating machine, optical coating machine, PVD vacuum coating line, and the turn-key project are available. Contact us now, E-mail: iks.pvd@foxmail.com