Chemical polishing of the vacuum chamber

Chemical polishing of the vacuum chamber

Chemical polishing is to dissolve the microscopic protruding part of the surface of the material in the chemical medium preferentially than the concave part, to obtain a smooth surface. The main advantage of this method is that it does not require complex equipment, can polish the workpiece with complex shape, and can polish many workpieces at the same time, with high efficiency. The core problem of chemical polishing is the preparation of polishing liquid. The surface roughness obtained by chemical polishing is generally 10μm.

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