chemical vapor deposition(CVD)

chemical vapor deposition(CVD)

Chemical Vapor Deposition (CVD) is a process that generates solid deposits by the reaction of substances in a gaseous or vapor state at the gas-phase or gas-solid interface. Chemical vapor deposition (CVD) is a new technology developed in recent decades to prepare inorganic materials. Chemical vapor deposition has been widely used to purify substances, prepare new crystals, and deposit various monocrystalline, polycrystalline or glassy inorganic film materials. These materials may be oxides, sulfides, nitrides, carbides, or binary or holy elemental interelement compounds in groups III-V, II-IV, IV-VI, and their physical functions can be precisely controlled by gas-doped deposition processes.
The process of chemical vapor deposition is divided into three important stages: the diffusion of reactive gas to the matrix surface, the adsorption of reactive gas to the matrix surface, the formation of solid sediment by chemical reaction on the matrix surface, and the separation of gaseous by-products from the matrix surface. The most common chemical vapor deposition reactions are thermal decomposition reactions, chemical synthesis reactions,s and chemical transport reactions.

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