Electron beam physical Vapor deposition technology (EB-PVD)

Electron beam physical Vapor deposition technology (EB-PVD) 

Electron beam physical vapor deposition technology is a technology in which the high-energy density electron beam directly heats the evaporating material, and the evaporating material is deposited on the substrate surface at a low temperature. The technology has the advantages of a high deposition rate (10kg/h ~ 15kg/h evaporation rate), dense coating, easy precise control of chemical composition, columnar crystal structure, no pollution, and high thermal efficiency. The disadvantage of this technology is that the equipment is expensive and the processing cost is high. At present, this technology has become a research hotspot in many countries.

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