​PVD pre-cleaning method 3 baking cleaning

PVD pre-cleaning method 3 baking cleaning 

Cleaning method: baking cleaning method
Purpose of cleaning: to remove water molecules
Cleaning means: the substrate is heated up
Cleaning process: the substrate is heated to 200℃ in a high vacuum to remove the residual cleaning fluid and moisture on the substrate. It can also be heated to a high temperature of 300-500℃ in the atmosphere, and the healing time is 30-60 minutes.

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