Glow Discharge And Arc Discharge Characteristics Comparison

Glow discharge and arc discharge characteristics comparison

Table 3 shows the comparison of discharge characteristics between glow discharge and arc discharge. It can be understood that PVD and CVD develop arc discharge coating technology because arc discharge can improve the plasma density in the coating process.

▲ Table 3 Glow discharge and arc discharge characteristics comparison table

It can be seen from Table 3 that the discharge current density of arc discharge is much higher than that of glow discharge, which causes the atoms of the metal film layer to ionize into more ions, which are attracted by the negative bias of the workpiece to accelerate to the workpiece and become high-energy film particles.

The unit of energy of an ion is the electron volt, denoted by "eV". It's related to temperature in the following formula, 1eV is equal to the energy of this substance at 11600K.

1 ev material 1.16 x 104 k

In vacuum evaporation and hot CVD technology, the temperature of film particles reaching the workpiece is 1000K~2000K, and its energy is equivalent to 0.1eV~0.2eV. However, the power of ions reaching the workpiece in the ion plating middle film can go 1eV~100eV, and its own significance is very high, and it is easy to deposit compound film. The temperature of TiN deposition by PVD decreased from 1000℃ to 500℃~200℃.

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