Innovation And Prospect Of High Ionization Rate Pulse Sputtering Technology
Dec 27, 2024| Innovation and prospect of high ionization rate pulse sputtering technology
It is difficult for the existing technology to make a major breakthrough in depositing denser and higher performance decorative film by adjusting the process parameters. High ionization rate pulse sputtering (HIPMS) has emerged as a new technology. The technology has the characteristics of high plasma density, high ionization rate of sputtered material, high average ion charge number, high ion energy and large proportion of film-forming ions. The film prepared by HPPMS technology is bombarded by high-energy ions, has fewer defects, smooth surface and more dense, and has excellent performance in hardness, binding force, wear resistance, corrosion resistance and high temperature oxidation resistance. With the continuous development and improvement of this technology, it is expected to promote the sputtering coating technology to achieve a new leap forward, and open up a broader development space for ion plating decorative film technology.
In summary, ion plating decorative film technology is facing many challenges in the process of continuous development, but through in-depth research and innovative exploration of various issues, it is expected to achieve further breakthroughs and improvements in technology in the future, meet the growing market demand and promote the sustainable development of related industries.
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