PVD Materials
Dec 28, 2017| PVD or Physical Vapor Deposition Materials comprise a range of metals that can be used in sputtering magnetrons to create thin films and coatings. Angstrom Sciences also offers a comprehensive selection of high-purity vacuum deposition materials including:
Aluminum Aluminum Copper Aluminum Copper Tungsten Aluminum Nitride Aluminum Oxide Aluminum Silicon Antimony Barium Barium Ferrite Barium Fluoride Barium Strontium Titanate Barium Titanate Barium Oxide Beryllium Bismuth Bismuth Lanthanum Titanium Bismuth Strontium Calcium Bismuth Strontium Titanate Bismuth Titanium Oxide Bismuth Trioxide Boron Boron Carbide Boron Nitride Cadmium Fluoride Cadmium Oxide Cadmium Selenide Cadmium Sulfide Cadmium Telluride Calcium Fluoride Calcium Oxide Calcium Silicate Calcium Titanate Carbon (Graphite) Carbon Steel Cerium Cerium Oxide Chromium Chromium Boride Chromium Oxide Chromium Silicide Cobalt Cobalt Chromium Cobalt Oxide Cobalt Silicide Cobalt Zirconium Copper | Copper Sulfide Copper Oxide Dysprosium Erbium Europium Gallium Gallium Arsenide Gallium Oxide Gadolinium Germanium Germanium Nitride Germanium Oxide Gold Gold Germanium Gold Palladium Gold Tin Gold Zinc Hafnium Hafnium Carbide Hafnium Nitride Hafnium Oxide Holmium Inconel Indium Indium Oxide Indium Tin Oxide Iridium Iron Iron Oxide Lead Lanthanum Lanthanum Aluminate Lanthanum Boride Lanthanum Oxide Lanthanum Strontium Cobalt Oxide Lanthanum Manganese Oxide Lead Oxide Lead Titanate Lead Zirconium Titanate Oxide Lithium Lithium Carbonate Lithium Cobalt Oxide Lithium Niobate | Lithium Phosphate Lithium Tantalate Magnesium Magnesium Fluoride Magnesium Monoxide Magnesium Oxide Manganese Molybdenum Molybdenum Disulfide Molybdenum Oxide Molybdenum Selenide Molybdenum Silicide Molybdenum Sulfide Neodymium Neodymium Gallium Oxide Neodymium Iron Boride Nickel Nickel Chromium Nickel Cobalt Nickel Oxide Nickel Silicide Nickel Vanadium Niobium Niobium Oxide Palladium Platinum Praseodymium Pryolytic Boron Nitride Rhenium Rhodium Ruthenium Samarium Samarium Cobalt Scandium Scandium Oxide Selenium Silicon Silicon Carbide Silicon Dioxide Silicon Monoxide Silicon Nitride Silver Silver Oxide Strontium Bismuth Niobium Oxide | Strontium Bismuth Tantalum Niobium Strontium-doped Lanthanum Strontium Oxide Strontium Titanate Tantalum Tantalum Carbide Tantalum Nitride Tantalum Oxide Tantalum Silicide Tantalum Sulfide Tellurium Terbium Terbium Iron Thallium Thallium Oxide Thorium Fluoride Thorium Oxide Tin Tin Oxide Titanium Titanium Boride Titanium Carbide Titanium Nitride Titanium Oxide Titanium Silicide Titanium Sulfide Tungsten Tungsten Silicide Tungsten Sulfide Tungsten Titanium Vanadium Vanadium Pent Oxide Yttrium Yttrium Barium Copper Oxide Yttrium Oxide Zinc Zinc Oxide Zinc Selenide Zinc Sulfide Zirconium Zirconium Nitride Zirconium Oxide Zirconium Silicate Zirconium Oxide Yttrium Oxide |
There are three factors that influence the quality and functionality of a film deposited by Physical Vapor Deposition (PVD): the quality and performance of the deposition source, the properties and structure of the deposition materials, and the intrinsic performance and layout of the deposition system and its’ associated peripherals.
Not all materials are equivalent in these processes as the chemical composition of the source material is only the starting point of a robust, application-specific process. Impurity levels, grain size, crystallographic structure/texture are but a few of the considerations that go into uniquely tailoring the structure of a suitable deposition structure.