The Progress Of Vapor Deposition Technology
Dec 22, 2022| The progress of vapor deposition technology can be summarized as follows:
(1) Equipment development. For example, large electron beam continuous evaporation equipment, various forms of magnetron sputtering equipment, new arc source ion plating and HCD and multi-arc composite ion plating equipment, various IBAD equipment and plasma immersion ion implantation (PIⅢI) equipment, etc.
(2) Process progress. It is mainly manifested in the increase in film types and the improvement of film properties. For example, various high-performance wear-resistant, corrosion-resistant, high-temperature corrosion-resistant, thermal barrier films, diamond-like and cubic boron nitride films, and a variety of ceramic, gradient, and multilayer composite films have been prepared.
(3) Composition of methods. The most advanced vapor deposition technology is the combination of single physical vapor deposition and chemical vapor deposition. They not only use a variety of new heating sources but also make full use of various chemical reactions, high-frequency electromagnetic (pulse, radio frequency, microwave, etc.), and plasma effects to activate the deposited particles. For example, reactive evaporation, reactive sputtering, ion beam sputtering, various plasma-excited chemical vapor deposition, etc., there are more composite methods in IBAD and PⅢ equipment. The introduction of the laser beam can not only steam plating but also composite in different ways.
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