Vacuum Coating in The Semiconductor Industry
Jul 29, 2023| The preparation of high-quality coatings on a common substrate is the best solution to meet the demanding requirements of the semiconductor industry. The vacuum coated surface can replace the expensive integral material, the required cost is greatly reduced, and the quality and performance are not reduced. In addition, vacuum coating helps to solve the problem of metal particle pollution in the semiconductor production process and improve efficiency and efficiency.
The supporting role of vacuum coating on semiconductor process includes: ① improve the service life of precision parts; ② Reduce production costs; ③ Reduce particle pollution; ④ Increase the uptime of the equipment; ⑤ Reduce electrostatic discharge.
Taking carbon-based films as an example, carbon-based films can better meet individual needs and significantly reduce production costs. The low friction and low wear characteristics provided by carbon-based films can significantly reduce the generation of particles and ensure high semiconductor production. The conductive properties of carbon-based films can meet the needs of back-end customers for no electrostatic discharge.
Take PVD hard coating as an example, PVD hard coating can help semiconductor OEM manufacturers, including non-electrostatic discharge coating, wear-resistant coating, high temperature protective coating, plasma etching barrier layer and point migration barrier layer
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