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  • Comparison of various dry coating technologies
    Dec 06, 2018

    Comparison of various dry coating technologies

    IKS PVD,PVD vacuum coating machine manufacture,contact with us now,iks.pvd@foxmail.com


    coating   method

    vacuum evaporation

       sputtering   deposition


     ion plating

    Chemical reaction plating(CVD)

    Can be plated material


    Certain metallic compounds

    Metal, alloy, chemical Complex,   ceramics, high molecular compound

    Metal, alloy, ceramics, compound

    Film material evaporation method

    vacuum evaporation

    Vacuum sputtering

    Evaporation, sputtering

    chemical reaction

    Substrate heating scope

    ·          30-200

    ·           150-500

    ·        150-800

    ·           300-1100

    rate of deposition nm/min

    · 2500-75000

    ·      10-100

    ·    2500-50000

    ·       much larger   than PVD

    The intensity of Interfacial adhesion

    ·    ordinary

    ·     preferably

    ·          good

    ·           good

    The purity of the film

    ·   It   depends on the purity of the film material and the film material supporting   boat or crucible

    ·   It   depends on the purity of target material and sputtering gas

    · Depending   on the film material, crucible and reaction gas purity

    · It   depends on the reaction gas

    The properties of the film

    ·    not uniform

    ·   High   density, less needle holes, more uniform film

    · High   density, more uniform, less pinhole

    · High   purity, good compactness

    Ability to coat complex surfaces

    ·  Straight   beam surface of substrate

    ·    Straight   beam surface of substrate

    ·     Good   diffraction, can be plated on all surfaces, the film is uniform

    ·   Can   be plated complex heteromorphic surface, deposition surface smooth