DLC Chemical Vapor Deposition
May 28, 2024| DLC Chemical Vapor Deposition (CVD) and Plasma Enhanced Chemical Vapor Deposition (PECVD) Chemical vapor deposition is a chemical phase reaction growth method. It is to pass several compounds or elemental reaction gases into the reaction chamber, decompose, desorption, and combine at the gas-solid interface to produce a uniform solid film. The main methods of chemical vapor deposition are atmospheric pressure, high and low-temperature chemical vapor deposition under low pressure, metal-organic chemical vapor deposition (MOCVD), plasma-assisted chemical vapor deposition (PVCD), and laser chemical vapor deposition (LCVD). The main one is plasma-assisted chemical vapor deposition.
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