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Experimental Materials And Methods For Effect Of Arc Source Current On Tin Film Structure

Jun 22, 2018


In this paper, TiN thin films were deposited on stainless steel substrate and Si wafer by multi-arc ion coating machine. The effect of arc source current on the structure and tribological properties of TiN thin films was studied from the principle of multi-arc ion plating.

 

Experimental materials and methods

 

The substrate material is stainless steel (1Cr18Ni9Ti) of 20 mm×20 mm×2 mm, with Si wafers. The preparation of the film was performed on a multi-arc ion coating machine. The sample was mechanically polished, alkali-washed, ultrasonically cleaned in alcohol, and finally fully dried into a clean coating chamber. Before the coating process, the substrate was cleaned by Ar+ etching for 5 min. The flow rate of argon gas during coating was zero, and the fixed flow rate of N2 was 0.22 SLM/s. The specific process parameters are listed in Table 1.

 

Table.1 TiN film deposition process parameters

 

Arc Source Current (A)Pressure (x10-1Pa)Temperature of Sudstrate (℃)
404.8
290
504.5306
60
4.3326
703.3345
802.430
901.3398
1001.0402


The surface morphology and fracture surface morphology of the film were observed by field emission scanning electron microscopy (FE-SEM). The hardness of the TiN film was measured with a microhardness tester with the load is 25 g and the loading time is 10 s. The friction coefficient of the film was measured by self-altered laboratory device. The TiN film sample is combined with the A3 steel to form a pair of friction pairs. During the test, the upper sample is fixed, the A3 steel disk rotates in dry friction, the rotational speed is 0.87rev/min, and the experimental load is 1N.


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