Factors affecting the uniformity of decorative film of ion plating and plasma sheath effect

Factors affecting the uniformity of decorative film of ion plating and plasma sheath effect

The uniformity of the coating layer includes uniformity of composition, uniformity of structure, and uniformity of film thickness. The uniformity of ion coating is affected by many factors, such as coating equipment structure, process conditions, workpiece mounting, and so on. Among them, the plasma sheath effect is closely related to the geometry of the workpiece, and the irregular geometry will cause the sheath "distortion", which will change the incidence Angle and deposition amount of charged particles on the corresponding surface, resulting in an uneven deposition. To ensure the uniformity of the coating, should consider the following factors: to ensure uniform plasma deposition space; The influence of space electric and magnetic fields on plasma uniformity is controlled. Ensure the reaction gas distribution evenly; Reasonable design of workpiece motion to compensate for uniformity; Avoid occlusion; The effects of sputtering rate and film growth stress are considered. Study the influence of plasma sheath in depth.

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