Ion beam-enhanced deposition (IBED)

Ion beam-enhanced deposition (IBED) is a new surface modification technology that combines ion implantation with thin film deposition. It refers to the formation of an elemental or compound film layer by the bombardment mixing of the ion beam with certain energy at the same time as vapor deposition coating. In addition to retaining the advantages of ion implantation, it can also continuously grow any thickness film under low bombardment energy and can synthesize compound film with the ideal chemical ratio at or near room temperature (including the new film which can not be obtained at room temperature and pressure). The technology has the advantages of low process temperature (< 200℃), a strong binding force for all substrates, a high-temperature phase, metastable phase, an amorphous alloy can be obtained at room temperature, easy control of the chemical composition, easy to-control of the growth process and so on. The main disadvantage is that the ion beam is direct, so it is difficult to deal with the complex shape of the surface.

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