Ion beam sputtering coating

Ion beam sputtering coating
Ion beam sputtering (IBS) is a thin film deposition technique that uses an ion source to deposit a sputtering target onto a substrate to produce the highest quality thin films with excellent accuracy. Compared with other sputtering methods, ion beam sputtering has higher accuracy and can accurately control the thickness of the substrate. The ion beam usually produced by an ion gun is focused on the sputtering target, and the sputtering target material is eventually deposited on the substrate to form a thin film.

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