What is the effect of grain size on target sputtering
Jan 14, 2022| What is the effect of grain size on target sputtering
Usually, the target material is polycrystalline with grain size ranging from micron to millimeter. The smaller the grain size is, the larger the grain boundary area is, and the greater the influence on the performance is. For the same target, the sputtering rate of the target with the fine grain is faster than that of the target with coarse grain. The thin films deposited by target sputtering with smaller grain size differences (uniform distribution) have more uniform thickness distribution. According to the study, if the grain size of the titanium target is controlled below 100um and the change of grain size is kept within 20%, the quality of the film obtained by sputtering can be greatly improved.
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