High Vacuum, Ultra-high Vacuum, And Extremely High Vacuum Applications

High vacuum, ultra-high vacuum, and extremely high vacuum applications

High vacuum conditions are commonly required in industrial and scientific fields, including but not limited to composite plastic molding, flight instruments, vacuum tubes, medical treatment, coating, mass spectrometry, electron microscopy, and more.

The application field of ultra-high vacuum is different. An important field of application is related to surface analysis techniques, such as X-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, thermal desorption spectroscopy, angular resolved photoelectron spectroscopy, field emission microscopy, field ion microscopy, and atomic probe tomography. In addition, ultra-high vacuum is also used in thin film growth and preparation techniques with strict purity requirements, such as atomic layer deposition, pulsed laser deposition, and molecular beam epitaxy. For all of these applications, an ultra-high vacuum is necessary to reduce surface contamination. In this regard, it is important to realize that at a pressure of 10-6mbar, it takes only 1 second for the contaminant to cover the surface, so longer experiments require lower pressures

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