Influence Of Magnetron Sputtering Process Parameters: Matrix Negative Bias

Influence of magnetron sputtering process parameters: matrix negative bias

The negative bias allows ions to bombard the growing film under the action of an accelerating electric field. The microstructure and mechanical properties of (Cr, Ti, Al) N quaternary coatings can be affected by changing the energy and quantity of ions reaching the substrate surface by adjusting the substrate negative bias. The researchers found that the binding force of (Cr,Ti,Al) N coating on the substrate increased first and then decreased with the increase of the substrate negative bias. This is because with the increase of negative bias pressure, the energy provided by ion bombardment to the film increases, which enhances the permeability of the film atoms to the substrate surface, and thus forms a strong binding force between the film and the substrate. However, when the negative bias is further increased, the bombardment of high-energy ions on the film will produce a large residual stress in the coating, which will weaken the adhesion of the film to the matrix. The researchers also found that negative bias mainly affects the wear resistance of (Cr, Ti, Al) N coatings by changing the film-base binding force. The better the film-base binding force of (Cr,Ti,Al) N coating, the smaller the wear rate and the longer the wear resistance time.

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