The Pumping Speed Of The Active Gas By The Ion Pump

The pumping speed of the active gas by the ion pump

Some gases are more chemically active, such as hydrogen, oxygen, nitrogen, carbon monoxide, carbon dioxide, etc., and they can easily form stable compounds with most metals. In the ion pump, these active gas molecules react with fresh titanium (or tantalum) sputtered out by ion bombardment of the cathode to form solid compounds such as titanium nitride and titanium oxide, which are "pumped away" (in fact, consumed by the reaction). In addition to reacting with the fresh cathode material being sputtered, the active gas will also be injected and diffused into the cathode material and remain there, thus achieving the effect of being "pumped away"; However, in addition to hydrogen, most of the active gas is not injected into the cathode material very deep, these parts of the gas injected into the cathode after reaching a certain amount, will be released under the subsequent ion bombardment, which is called the saturation effect (refer to the article: ion pump saturation pumping speed, unsaturated pumping speed and nominal pumping speed). At low pressure, the Diode pump with the same nominal pumping speed has the highest pumping speed for active gases, followed by Noble Diode, and at higher pressures (above 5E-6 mbar), the StarCell ion pump has the highest pumping speed.

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