The Pumping Speed Of The Ion Pump To The Inert Gas

The pumping speed of the ion pump to the inert gas

The main property of noble gases is that they are difficult to react with other elements. Therefore, the film produced by the cathode material sputtering will not react with the inert gas. In addition, since the diffusion effect of the inert gas in the cathode material is also not strong, the pumping speed generated by injection and diffusion into the cathode material is also limited. Therefore, the ordinary bipolar ion pump has a very small pumping speed for the inert gas. The little pumping speed is due to the fact that some of the inert gas molecules are buried by the sputtered cathode material. After colliding with the cathode, the inert gas ions are neutralized into molecules and scattered from the cathode without loss of energy, and these inert gas molecules maintain enough energy to implant/adhere to the anode or pump wall, where they will be buried by the cathode material produced by sputtering.
Noble Diode and StarCell ion pumps have higher pump speed for noble gases by varying the type of cathode material or the Angle at which the ions come in, increasing the probability that the inert gases will scatter to the anode tube or pump wall and get buried. The inert gas pumping speed of StarCell ion pump can reach about 20% of the nominal pumping speed, which is better than Noble Diode. Moreover, the special cathode shape makes the use of the cathode material more efficient and therefore has a longer life (about 50% higher than other forms of ion pumps).

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