How PECVD works
Apr 17, 2024| How PECVD works
PECVD method is used to grow silicon nitride thin films using the characteristics of non-equilibrium plasma, that is, plasma molecules, atoms, ions or active groups are the same as the surrounding environment, and non-equilibrium electrons due to their small mass, their average temperature can be two orders of magnitude larger than other particles, so under normal conditions, High temperatures (300 ° C -450 ° C) are needed to achieve many reactions. During the deposition process, the special gas NH3 and SiH4 molecules have intense thermal motion under the action of high frequency and collide with each other to ionize their molecules and then generate SiNx.
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