Ion plating
May 01, 2024| Ion plating
The basic principle of ion plating is that under vacuum conditions, some plasma ionization technology is used to partially ionize the plating atoms into ions, and at the same time, many high-energy neutral atoms are generated, and negative bias is added to the substrate.
In this way, under the action of deep negative bias, ions are deposited on the surface of the substrate to form a thin film.
PVD technology can be used not only for the deposition of metal and alloy films but also for the deposition of materials such as compounds, ceramics, semiconductors, and polymer films.
In display production, vacuum evaporation PVD technology is used to deposit active metal electrodes and deposit small molecules of HIL/HTL/EML/ETL/EIL in AMOLED with the FMM process. The magnetron sputtering PVD technology is used on metals such as Al, Cr, Ta, Mo, etc. as well as on transparent ITO of pixel electrodes (1).
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