PECVD-Operating Frequency Of The RF Power Supply

Rf PECVD usually adopts 50kHz~13.56MHz frequency band RF power supply, which has high frequency, strong bombardment effect of ions in plasma, more dense deposited film, but the damage to substrate is also relatively large. The uniformity of the film with high frequency deposition is significantly better than that of the low frequency, because when the frequency of the RF power supply is low, the electric field near the edge of the plate is weak, and the deposition speed will be lower than the center area of the plate, and the difference between the edge and the center area will be smaller when the frequency is high.

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