Vacuum Sputtering Coating
Apr 29, 2024| Vacuum Sputtering Coating
The basic principle of Vacuum Sputtering is to make argon glow discharge under the vacuum condition filled with argon (Ar) gas, then argon (Ar) atoms ionize into argon ion (Ar+), argon ion accelerates under the action of electric field force to bombard the cathode target made of plating material, the target will be sputtered out and deposited to the surface of the workpiece.
Depending on the current used, the process can be further divided into DC sputtering using DC glow discharge, RF glow discharge RF sputtering, and magnetron (M) glow discharge caused by magnetron sputtering.
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